High-k Materials in Multi-Gate FET Devices
portes grátis
High-k Materials in Multi-Gate FET Devices
Singla, Parveen; Davim, J. Paulo; Tayal, Shubham
Taylor & Francis Ltd
09/2021
164
Dura
Inglês
9780367639686
15 a 20 dias
376
Descrição não disponível.
Chapter 1 Introduction to Multi-Gate FET Devices
Chapter 2 High-k Gate Dielectrics and Metal Gate Stack Technology for
Advance Semiconductor Devices: An Overview
Chapter 3 Influence of High-k Material in Gate Engineering and in
Multi-Gate Field Effect Transistor Devices
Chapter 4 Trap Charges in High-k and Stacked Dielectric
Chapter 5 Impact of High-k Dielectric on the Gate-Induced Drain
Leakage of Multi-Gate FETs
Chapter 6 Advanced FET Design Using High-k Gate Dielectric and
Characterization for Low-Power VLSI
Chapter 7 Simulation and Analysis of Gate Stack DG MOSFET with
Application of High-k Dielectric Using Visual TCAD
Chapter 8 Novel Architecture in Gate All-Around (GAA) MOSFET
with High-k Dielectric for Biomolecule Detection
Chapter 9 Asymmetric Junctionless Transistor: A SRAM
Performance Study
Chapter 10 Performability Analysis of High-k Dielectric-Based
Advanced MOSFET in Lower Technology Nodes
Index
Chapter 2 High-k Gate Dielectrics and Metal Gate Stack Technology for
Advance Semiconductor Devices: An Overview
Chapter 3 Influence of High-k Material in Gate Engineering and in
Multi-Gate Field Effect Transistor Devices
Chapter 4 Trap Charges in High-k and Stacked Dielectric
Chapter 5 Impact of High-k Dielectric on the Gate-Induced Drain
Leakage of Multi-Gate FETs
Chapter 6 Advanced FET Design Using High-k Gate Dielectric and
Characterization for Low-Power VLSI
Chapter 7 Simulation and Analysis of Gate Stack DG MOSFET with
Application of High-k Dielectric Using Visual TCAD
Chapter 8 Novel Architecture in Gate All-Around (GAA) MOSFET
with High-k Dielectric for Biomolecule Detection
Chapter 9 Asymmetric Junctionless Transistor: A SRAM
Performance Study
Chapter 10 Performability Analysis of High-k Dielectric-Based
Advanced MOSFET in Lower Technology Nodes
Index
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Low Power VLSI;SCEs;FET;Oxide Semiconductor Field Effect Transistor;Field Effect Transistors;Multi-gate Devices;SRAM Cell;Gate Oxide;Equivalent Oxide Thickness;Gate Stack;Power Consumption;Gate Terminal;GIDL;MOSFET Device;MOS Transistor;Trap Charges;Flat Band Voltage;Steep Sub-threshold Slope;Carbon Nanotube FETs;Nanowire FET;Conventional MOSFET;Gate Drain Overlap;6T SRAM Cell;Access Transistor;Sentaurus TCAD
Chapter 1 Introduction to Multi-Gate FET Devices
Chapter 2 High-k Gate Dielectrics and Metal Gate Stack Technology for
Advance Semiconductor Devices: An Overview
Chapter 3 Influence of High-k Material in Gate Engineering and in
Multi-Gate Field Effect Transistor Devices
Chapter 4 Trap Charges in High-k and Stacked Dielectric
Chapter 5 Impact of High-k Dielectric on the Gate-Induced Drain
Leakage of Multi-Gate FETs
Chapter 6 Advanced FET Design Using High-k Gate Dielectric and
Characterization for Low-Power VLSI
Chapter 7 Simulation and Analysis of Gate Stack DG MOSFET with
Application of High-k Dielectric Using Visual TCAD
Chapter 8 Novel Architecture in Gate All-Around (GAA) MOSFET
with High-k Dielectric for Biomolecule Detection
Chapter 9 Asymmetric Junctionless Transistor: A SRAM
Performance Study
Chapter 10 Performability Analysis of High-k Dielectric-Based
Advanced MOSFET in Lower Technology Nodes
Index
Chapter 2 High-k Gate Dielectrics and Metal Gate Stack Technology for
Advance Semiconductor Devices: An Overview
Chapter 3 Influence of High-k Material in Gate Engineering and in
Multi-Gate Field Effect Transistor Devices
Chapter 4 Trap Charges in High-k and Stacked Dielectric
Chapter 5 Impact of High-k Dielectric on the Gate-Induced Drain
Leakage of Multi-Gate FETs
Chapter 6 Advanced FET Design Using High-k Gate Dielectric and
Characterization for Low-Power VLSI
Chapter 7 Simulation and Analysis of Gate Stack DG MOSFET with
Application of High-k Dielectric Using Visual TCAD
Chapter 8 Novel Architecture in Gate All-Around (GAA) MOSFET
with High-k Dielectric for Biomolecule Detection
Chapter 9 Asymmetric Junctionless Transistor: A SRAM
Performance Study
Chapter 10 Performability Analysis of High-k Dielectric-Based
Advanced MOSFET in Lower Technology Nodes
Index
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Low Power VLSI;SCEs;FET;Oxide Semiconductor Field Effect Transistor;Field Effect Transistors;Multi-gate Devices;SRAM Cell;Gate Oxide;Equivalent Oxide Thickness;Gate Stack;Power Consumption;Gate Terminal;GIDL;MOSFET Device;MOS Transistor;Trap Charges;Flat Band Voltage;Steep Sub-threshold Slope;Carbon Nanotube FETs;Nanowire FET;Conventional MOSFET;Gate Drain Overlap;6T SRAM Cell;Access Transistor;Sentaurus TCAD
