Nanolithography and Surface Microscopy with Electron Beams
Nanolithography and Surface Microscopy with Electron Beams
Hytch, Martin; Hawkes, Peter W.
Elsevier Science Publishing Co Inc
10/2024
232
Dura
9780443314629
Pré-lançamento - envio 15 a 20 dias após a sua edição
Descrição não disponível.
Introduction and Summary
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5A electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5A electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Advances in Imaging; Electron Physics
Introduction and Summary
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5A electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5A electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.