Nanolithography and Surface Microscopy with Electron Beams

Nanolithography and Surface Microscopy with Electron Beams

Hytch, Martin; Hawkes, Peter W.

Elsevier Science Publishing Co Inc

10/2024

232

Dura

9780443314629

Pré-lançamento - envio 15 a 20 dias após a sua edição

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Introduction and Summary
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1. Early life
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2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
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3. Formation of cones and ridges on ion-etched surfaces
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4. Microfabrication in an SEM
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5. High Resolution Short Focal Length Lens Electron Probe
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6. Low-Loss Surface Microscopy in short focal length Probe
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7. Microfabrication in the 5A electron probe
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8. Nanodevices fabricated in the HR Probe
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9. Fabrication of Structures with Dimensions Below 10 nm
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10. Semiconductor Lithography and Processing
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11. Nanolithography at 400kV
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12. Last twenty years and future of semiconductor chips
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Advances in Imaging; Electron Physics