Kinetic Studies in GeO2/Ge System
Kinetic Studies in GeO2/Ge System
A Retrospective from 2021
Wang, Sheng-Kai
Taylor & Francis Ltd
06/2022
134
Dura
Inglês
9781032257440
15 a 20 dias
449
Descrição não disponível.
1. Introduction 2. Fabrication and Characterization Methods 3. Desorption Kinetics of GeO from GeO2/Ge 4. Structural Transition Kinetics in GeO2/Ge 5. Oxidations in GeO2/Ge Stack
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Microelectronic Engineering;Semiconductors;Electronic Materials;Condenser Matter Physics;TDS Spectrum;TDS Measurement;Ge System;Ge Interface;AIP Publishing;Ge Substrate;TDS;Consumption Rate;UHV Condition;Deal Grove Model;Oxygen Vacancy Diffusion;Desorption Kinetics;Ge Wafer;Oxygen Vacancy;Gate Stack;Active Oxidation;Isotope Tracing Study;Si Stack;MOS Technology;Quartz Sample Holder;Passive Oxidation;QMS;Ge Structure;Sample Preparation;CVD System
1. Introduction 2. Fabrication and Characterization Methods 3. Desorption Kinetics of GeO from GeO2/Ge 4. Structural Transition Kinetics in GeO2/Ge 5. Oxidations in GeO2/Ge Stack
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
Microelectronic Engineering;Semiconductors;Electronic Materials;Condenser Matter Physics;TDS Spectrum;TDS Measurement;Ge System;Ge Interface;AIP Publishing;Ge Substrate;TDS;Consumption Rate;UHV Condition;Deal Grove Model;Oxygen Vacancy Diffusion;Desorption Kinetics;Ge Wafer;Oxygen Vacancy;Gate Stack;Active Oxidation;Isotope Tracing Study;Si Stack;MOS Technology;Quartz Sample Holder;Passive Oxidation;QMS;Ge Structure;Sample Preparation;CVD System