Kinetic Studies in GeO2/Ge System

Kinetic Studies in GeO2/Ge System

A Retrospective from 2021

Wang, Sheng-Kai

Taylor & Francis Ltd

06/2022

134

Dura

Inglês

9781032257440

15 a 20 dias

449

Descrição não disponível.
1. Introduction 2. Fabrication and Characterization Methods 3. Desorption Kinetics of GeO from GeO2/Ge 4. Structural Transition Kinetics in GeO2/Ge 5. Oxidations in GeO2/Ge Stack
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Microelectronic Engineering;Semiconductors;Electronic Materials;Condenser Matter Physics;TDS Spectrum;TDS Measurement;Ge System;Ge Interface;AIP Publishing;Ge Substrate;TDS;Consumption Rate;UHV Condition;Deal Grove Model;Oxygen Vacancy Diffusion;Desorption Kinetics;Ge Wafer;Oxygen Vacancy;Gate Stack;Active Oxidation;Isotope Tracing Study;Si Stack;MOS Technology;Quartz Sample Holder;Passive Oxidation;QMS;Ge Structure;Sample Preparation;CVD System